Nicolas Breil Applied Materials LinkedIn
Nicolas breil challenges outlet of nickel silicidation
Share. Visit »
Fabrication Characterization and Modeling of Metallic Source
PDF Lanthanum and Lanthanum Silicide Contacts on N Type Silicon
COBALT GERMANIDE CONTACTS
Micro gap thermionic converters materials design and fabrication
Monolithic and Single Crystalline Aluminum Silicon
Monolithic and Single Crystalline Aluminum Silicon
Challenges of nickel silicidation in CMOS technologies ScienceDirect
PDF Integration of PtSi in p Type MOSFETs Using a Sacrificial Low
PDF A comprehensive atomistic picture of the as deposited Ni Si
Monolithic and Single Crystalline Aluminum Silicon
Fabrication and characterization of rare earth silicide thin films
Fluorine free tungsten films as low resistance liners for tungsten
XRD spectra of the Pt x Ge y phases obtained from alloying of a Ge
Figure 9 from Ultra low NMOS contact resistivity using a novel
Variations of the sheet resistance Rs with the temperature of
Monolithic and Single Crystalline Aluminum Silicon
Study of SiGe selective epitaxial process integration with high k
Nicolas Breil Applied Materials LinkedIn
PDF A comprehensive atomistic picture of the as deposited Ni Si
Figure 2 from Ultra low NMOS contact resistivity using a novel
Figure 2 from Ti and NiPt Ti liner silicide contacts for advanced
NiSiTb alloy interlayer properties at NiSi Si junctions for
Nicolas Breil Applied Materials LinkedIn
Monolithic and Single Crystalline Aluminum Silicon
215th ECS Meeting Meeting Program by The Electrochemical Society
Contribution l tude de techniques de siliciuration avanc es
Effect of SIIS on work function of self aligned PtSi FUSI metal
PDF Self Formation of Sub 10 nm Nanogaps by Silicidation for
Monolithic and Single Crystalline Aluminum Silicon
PDF Challenges of nickel silicidation in CMOS technologies
Temperature dependence of and measured at 3.5 eV for the Pt10 nm
PDF Electronic contribution in heat transfer at metal
Ti and NiPt Ti liner silicide contacts for advanced technologies
PDF Challenges of nickel silicidation in CMOS technologies
Figure 6 from Ultra low NMOS contact resistivity using a novel
Effect of Porosity on the Performance of a La0.7Sr0.3VO3 Anode of
Scheme of the proposed PtSi integration sequence and tilted aerial
EUROSOI D4.9 Report on EUROSOI Workshop held in Grenoble 25 27
Nicolas Breil Applied Materials LinkedIn
